Semiconductor integrated circuit device and process for manufacturing the same

ABSTRACT

A semiconductor integrated circuit device comprises a plurality of holes in an interlayer insulating film beneath a bonding pad wherein a plug is buried in the respective holes and is made of the same conductive film (W/TiN/Ti) as a plug in a through-hole. Any wire as a second layer is not formed in a lower region of the bonding pad. The plug buried in the holes is connected only to the upper boding pad and is not connected to a lower wire.

BACKGROUND OF THE INVENTION

[0001] This invention relates to a semiconductor integrated circuitdevice and also to a technique of manufacturing the same. Moreparticularly, the invention relates to a technique effective forimproving the property of boding between a bonding pad and an interlayerinsulating film provided therebelow.

[0002] In order to prevent the separation of a bonding pad that willoccur in the course of the step of sealing, with a tape carrier package(TCP), a semiconductor chip including an interlayer insulating filmhaving a three-layered structure wherein a spin-on-glass (SOG) film issandwiched between two silicon oxide films, Japanese Laid-open PatentApplication No. Hei 10(1998)-247664 discloses a technique wherein adummy wiring is provided below the bonding pad formed on the interlayerinsulating film so as to increase an area of mutual contact of the twosilicon oxide films at the lower region of the bonding pad, therebysuppressing the interfacial separation between the SOG film and thesilicon oxide films.

SUMMARY OF THE INVENTION

[0003] In recent years, as a chip size is more reduced owing to a higherdegree of integration of LSI, the bonding pad is also reduced in size.

[0004] We have found that there is being actualized a phenomenon whereina stress exerted per unit area of a bonding pad increases at the time ofwire bonding, and an uppermost Al (aluminium) wire constituting abonding pad and a lower interlayer insulating film are separated fromeach other at the interface thereof. Especially, in the course ofmanufacture of MCP (multi chip package), there is used a KGD (known gooddie) technique in order to guarantee the quality of individual chipsprior to assembling. In this ca'se, a wire is bonded on the respectivebonding pads upon inspection at the stage of individual chips and alsoat the package stage, under which we have found that the bonding pad ismore liable to separate.

[0005] As a measure for preventing the separation of the bonding pad, itmay occur that the bonding pad is constituted, for example, of atwo-layered structure including an uppermost Al wire and a lower Al wireso as to increase strength thereof. In this case, however, the structureis so designed as to include an interlayer insulating film, which ismade of silicon oxide whose hardness is higher than Al, interposedbetween the two Al wires. This will permit the hard layer insulatinglayer to be cracked when wire bonded, thereby causing the separation ofthe bonding pad.

[0006] An object of the invention is to provide a technique ofsuppressing the separation of a bonding pad.

[0007] The above and other objects, and novel features of the inventionwill become apparent from the description of the specification andaccompanying drawings.

[0008] Typical embodiments of the invention are summarized below.

[0009] (1) The semiconductor integrated circuit device according to theinvention comprises a plurality of wiring layers formed on asemiconductor substrate through an interlayer insulating film, a firstinterlayer insulating film provided beneath a bonding pad formed on anupper wiring layer, and a first plug formed in the first interlayerinsulating film in such a way that a first conductive film is buried ina hole formed in the first interlayer insulating film wherein any wireconnected to the first plug is not formed in a wiring layer beneath thefirst plug.

[0010] (2) The semiconductor integrated circuit device of the inventioncomprises a plurality of wiring layers formed on a semiconductorsubstrate through an interlayer insulating film, a bonding pad formed onan upper wiring layer and connected to a wire, a first interlayerinsulating film provided at a lower region of the wire, and a first plugformed in the first interlayer insulating film in such a way that afirst conductive film is buried in a hole formed in the first interlayerinsulating film wherein any wire is not formed in a wiring layer belowthe first plug.

[0011] (3) The semiconductor integrated circuit device of the inventioncomprises a plurality of wiring layers formed on a semiconductorsubstrate through an interlayer insulating film, a bonding pad formed atan uppermost wiring layer, a first interlayer insulating film providedbeneath the bonding pad, a first plug formed in the first interlayerinsulating film in such a way that a first conductive film is buried ina hole formed in the first interlayer insulating film, and a wire formedin a wiring layer beneath the first plug and made of a third conductivefilm whose hardness is higher than that of a second conductive filmconstituting the uppermost wire.

[0012] (4) The method for manufacturing a semiconductor integratedcircuit device according to the invention comprises the steps of:

[0013] (a) forming a wire in an element-forming region on asemiconductor substrate and further forming an interlayer insulatingfilm over the wire;

[0014] (b) etching the first interlayer insulating film in theelement-forming region to form a first through-hole reaching the wire,and etching the first interlayer insulating film in a bondingpad-forming region to form a hole;

[0015] (c) forming a barrier metal film on the first interlayerinsulating film comprising the inner surfaces of the hole and the innersurfaces of the first through-hole and forming a first conductive filmcontaining as its main component a refractory metal on the upper portionof the barrier metal film so that the first conductive film is buried inthe hole and the first through-hole;

[0016] (d) removing the first conductive film from the upper portion ofthe first conductive film by etching to form a first plug constituted ofthe barrier metal film and the first conductive film in the hole andalso a second plug constituted of the barrier metal film and the firstconductive film in the first through-hole; and

[0017] (e) etching a second conductive film formed on the upper portionof the first interlayer insulating film so that an uppermost wire isformed on the first interlayer insulating film in the element-formingregion and forming a bonding pad on the first interlayer insulating filmin the bonding pad-forming region.

BRIEF DESCRIPTION OF THE DRAWINGS

[0018]FIG. 1 is a plan view showing a semiconductor chip, as a whole,formed on a semiconductor integrated circuit device according to oneembodiment of the invention;

[0019]FIG. 2 is a sectional view of an essential part of a semiconductorsubstrate forming the semiconductor integrated circuit device accordingto the one embodiment of the invention;

[0020]FIG. 3 is a plan view showing a layout of a bonding pad and a plugformed therebelow;

[0021]FIG. 4 is a sectional view of the essential part of thesemiconductor substrate, taken along the line A-A of FIG. 3;

[0022]FIG. 5 is a sectional view of an essential part of a semiconductorsubstrate showing a step in a process for manufacturing a semiconductorintegrated circuit device according to the one embodiment of theinvention;

[0023]FIG. 6 is a sectional view of the essential part of thesemiconductor substrate showing another step in the process formanufacturing the semiconductor integrated circuit device according tothe one embodiment of the invention;

[0024]FIG. 7 is a sectional view of the essential part of thesemiconductor substrate showing a further step in the process formanufacturing a semiconductor integrated circuit device according to theone embodiment of the invention;

[0025]FIG. 8 is a sectional view of the essential part of thesemiconductor substrate showing a still further step in the process formanufacturing a semiconductor integrated circuit device according to theone embodiment of the invention;

[0026]FIG. 9 is a sectional view of the essential part of thesemiconductor substrate showing a yet further step in the process formanufacturing a semiconductor integrated circuit device according to theone embodiment of the invention;

[0027]FIG. 10 is a sectional view of the essential part of thesemiconductor substrate showing yet another step in the process formanufacturing a semiconductor integrated circuit device according to theone embodiment of the invention;

[0028]FIG. 11 is a sectional view of the essential part of thesemiconductor substrate showing another step in the process formanufacturing a semiconductor integrated circuit device according to theone embodiment of the invention;

[0029]FIG. 12 is a sectional view of the essential part of thesemiconductor substrate showing still another step in the process formanufacturing a semiconductor integrated circuit device according to theone embodiment of the invention;

[0030]FIG. 13 is a sectional view of the essential part of thesemiconductor substrate showing another step in the process formanufacturing a semiconductor integrated circuit device according to theone embodiment of the invention;

[0031]FIG. 14 is a sectional view of the essential part of thesemiconductor substrate showing another step in the process formanufacturing a semiconductor integrated circuit device according to theone embodiment of the invention;

[0032]FIG. 15 is a sectional view of an essential part of asemiconductor substrate showing a semiconductor integrated circuitdevice according to another embodiment of the invention;

[0033]FIG. 16 is a sectional view of an essential part of asemiconductor substrate showing a semiconductor integrated circuitdevice according to another embodiment of the invention;

[0034]FIG. 17 is a sectional view of an essential part of asemiconductor substrate showing a semiconductor integrated circuitdevice according to another embodiment of the invention;

[0035]FIG. 18 is a sectional view of the essential part of thesemiconductor substrate showing the semiconductor integrated circuitdevice according to another embodiment of the invention; and 4 FIG. 19is a sectional view of the essential part of the semiconductor substrateshowing the semiconductor integrated circuit device according to anotherembodiment of the invention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0036] The embodiments of the invention are described in detail withreference to the accompanying drawings. It will be noted that in all thefigures illustrating the embodiments of the invention, like referencenumerals indicate like parts or members and may not be repeatedlyexplained after once illustrated.

[0037]FIG. 1 is a plan view showing, as a whole, semiconductor chip 1Aforming DRAM (dynamic random access memory) according to one embodimentof the invention.

[0038] A DRAM having a memory capacity, for example, of 256 M bit isformed on the main surface of the rectangular semiconductor chip 1A.This DRAM has a memory portion divided into a plurality of memory matsMM and peripheral circuit portions PC arranged therearound. At thecenter of the semiconductor chip 1A, a plurality of bonding pads BP arearranged in line, to which wires, bump electrodes and the like areconnected.

[0039]FIG. 2 is a sectional view showing an essential part of asemiconductor substrate (hereinafter referred to simply as substrate) onwhich the DRAM is formed. The left side portion of this figure indicatespart of the memory portion (memory mat MM), the central portionindicates part of the peripheral circuit portion PC, and the right sideportion indicates part of a region (i.e. the central portion of thesemiconductor chip 1A) at which the bonding pads BP are formed,respectively.

[0040] For instance, a p-type well 2 is formed on the main surface of asubstrate 1 made of p-type single crystal silicon, an element-isolatinggroove 4 is formed in an element-isolating region of the p-type well.The element-isolating groove 4 has such a structure that a groove formedby etching the substrate 1 is buried with an insulating film such as ofsilicon oxide.

[0041] A plurality of memory cells are formed in an active region of thep-type well 2 of the memory portion. The respective memory cells areconstituted of one MISFET (metal insulator semiconductor field effecttransistor) Qt for memory cell selection constituted of an n-channelMISFET, and one information storage capacitor element C connected inseries with the MISFET Qt for memory cell selection.

[0042] The MISFET Qt for memory cell selection is constituted mainly ofa gate oxide film 5, a gate electrode 6A integrally constituted with aword line, and n-type semiconductor regions (source, drain) 7. The gateelectrode 6A (word line) is made of a three-layered conductive film, forexample, of a low resistance polysilicon film doped with P (phosphorus),a WN (tungsten nitride) film and a W (tungsten) film.

[0043] In the active region of the p-type well 2 of the peripheralcircuit portion, an n-channel MISFET Qn is formed. The n-channel MISFETQn is constituted, mainly, of the gate oxide 5, a gate electrode 6B madeof such a three-layered conductive film as the gate electrode 6A (wordline), and n-type semiconductor regions 8 (source, drain) having an LDD(lightly doped drain) structure. An n-type well is formed in thesubstrate 1 of a region of the peripheral circuit portion not shown inthe figure. A p-channel MISFET is formed at the n-type well. Moreparticularly, a circuit in the peripheral circuit portion is constitutedwith a complementary MISFET made of the n-channel MISFET Qn and thep-channel MISFET in combination.

[0044] Silicon oxide films 9, 10 are, respectively, formed on the MISFETQt for memory cell selection and the n-channel MISFET Qn, and a bit lineBL, with which data of a memory cell is read out, is formed on the upperportion of the silicon oxide film 10 of the memory portion. The bit lineBL is constituted of a conductive film wherein a W film is formed on abarrier metal film made, for example, of a multi-layered film includinga Ti (titanium) film and a TiN (titanium nitride) film. The bit line BLis electrically connected with one of the n-type semiconductor regions(source, drain) of the MISFET Qt for memory cell selection via a contacthole 11 that is made of a low resistance polysilicon film doped, forexample, with P (phosphorus) and buried with a plug.

[0045] Wires 13, 14 of a first layer are formed over the silicon oxidefilm 10 of the peripheral circuit portion. The wires 13, 14 are,respectively, constituted of a multi-layered film of a barrier metalfilm and a W film, like the bit line BL. These wires 13, 14 areelectrically connected with the n-type semiconductor regions (source,drain) of the n-channel MISFET Qn via contact holes 15, 16 made of amulti-layered film, for example, of a barrier metal (TiN/Ti) film and aW film and buried with a plug, respectively.

[0046] A silicon oxide film 17 is formed over the bit line BL and thewires 13, 14, respectively, and an information storage capacitor elementC is formed over a silicon oxide film 17 of the memory portion. Theinformation storage capacitor element C is formed in a deep grooveformed by etching a silicon nitride film 18 on the silicon oxide film 17and a thick silicon oxide film 19 formed thereon, and is constituted ofa lower electrode (storage electrode) 21, a capacitive insulating film22 on the lower electrode 21, and an upper electrode (plate electrode)23 formed on the capacitive insulating film 22.

[0047] The lower electrode 21 of the information storage capacitorelement C is constituted of a low resistance polysilicon film doped, forexample, with P (phosphorus), and is electrically connected to the otherof the n-type semiconductor regions (source, drain) of MISFET Qt formemory cell selection via the through-hole 20, in which a plug madesimilarly of a low resistance polysilicon film, and the contact hole 12provided therebelow. The capacitive insulating film over the lowerelectrode 21 is made, for example, of a Ta₂O₅ (tantalum oxide) film, andthe plate electrode 23 is made, for example of a TiN film.

[0048] A silicon oxide film 25 is formed over the information storagecapacitor element C. A second-layer wire 26 is formed on or over thesilicon oxide film 25 of the memory portion, and a second-layer wire 27is likewise formed on or over the silicon oxide film 25 of theperipheral circuit portion. The wire 26 of the memory portion isconstituted of a conductive film containing Al (aluminium) as a maincomponent, e.g. a three-layered conductive film consisting of a thick Alalloy film (26 b) containing Cu (copper) and Si (silicon), and a thin Tifilm (26 a) and a thin TiN film (26 c) sandwiching the Al alloy film (26b) therebetween. Similarly, the wire 27 of the peripheral circuitportion is constituted of a three-layered conductive film consisting ofa thick Al alloy film (27 b), and a thin Ti film (27 a) and a thin TiNfilm (27 c) sandwiching the Al alloy film (27 b) therebetween. The wire27 is electrically connected to the first wiring layer 13 via athrough-hole 24 formed in the silicon oxide film 25 and the insulatingfilms (silicon oxide film 19, silicon nitride film 18 and silicon oxidefilm 17) provided therebelow. A plug 28, which is made, for example, ofa multi-layered film of a barrier metal (TiN/Ti) film (28 a) and a Wfilm (28 b), is buried in the through-hole 24.

[0049] An interlayer insulating film (first interlayer insulating film)29, which is made of a three-layered insulating multi-layered filmconsisting, for example, of a silicon oxide film, a spin-on-glass (spincoating) film and a silicon oxide film, is formed over the second-layerwires 26, 27. A third-layer wire 30 is formed over the interlayerinsulating film 29 at the memory portion, and a third-layer wire 31 islikewise formed over the interlayer insulating film 29 at the peripheralcircuit portion. Moreover, a bonding pad BP is formed over theinterlayer insulating film 29 at the right side of FIG. 2 (i.e. abonding pad-forming region).

[0050] The wire 30 at the memory portion is constituted of athree-layered conductive film consisting of a thick Al alloy film (30b), and a thin Ti film (30 a) and a thin TiN film (30 c) sandwiching theAl alloy film (30 b) therebetween. Similarly, the wire 31 at theperipheral circuit portion is constituted of a three-layered conductivefilm consisting of a thick Al alloy film (31 b), and a thin Ti film (31a) and a thin TiN film (31 c) sandwiching the Al alloy film (31 b)therebetween. This wire 31 is electrically connected to the second-layerwire 27 via a through-hole 33A formed in the interlayer insulating film29. A plug (second plug) 34 made, for example, of a multi-layered filmof a barrier metal (TiN/Ti) film 34 a and a W film 34 b is buried in thethrough-hole 33A.

[0051] The bonding pad BP is formed by use of the wire formed in thesame step as the third-layer wires 30, 31, each made of thethree-layered conductive film. In the step of forming the bonding padBP, the uppermost TiN film is removed, so that the pad is actuallyconstituted of a two-layered conductive film made of thin Ti film (42 a)and a thick Al alloy film (42 b) above the Ti film.

[0052] In the interlayer insulating film 29 beneath the bonding pad BP,a plurality of holes 33B are formed at certain intervals, and a plug(first plug) 34 is buried inside each of the holes 33B. This plug 34 isconstituted, for example, of the multi-layered film of the barrier metal(TiN/Ti) film 34 a and the W film 34 b, like the plug 34 inside thethrough-hole 33A.

[0053] As shown, any second-layer wire is not formed in the region belowthe bonding pad BP. More particularly, the plug 34 buried in the hole33B is connected only to the upper bonding pad BP and is not connectedto the second-layer wire. In this way, the hole 33 B, in which the plug34 is buried, is formed below the bonding pad BP, and any wire connectedto the plug 34 is not formed in the wiring layer (i.e. the second wiringlayer) beneath the plug 34, so that, as described hereinafter, theadhesion between the bonding pad BP and the lower interlayer insulatingfilm 29 can be improved.

[0054]FIG. 3 is a plan view showing a layout of the bonding pad BP andthe hole 33B (plugs 34), and FIG. 4 is a section view, taken along theline A-A of FIG. 3.

[0055] As shown in these figures, the bonding pad has a substantiallysquare, flat shape, with its outer dimensions, for example, of 80 μm inlength×80 μm in width. The bonding pad BP is connected at one sidethereof with one end of a lead wire 32. The lead wire 32 is connected,at the other end, with a lower (second-layer) wire 35 via 33C formed inthe interlayer insulating film 29. The through-hole 33C is buriedtherein with the plug 34 made of the same type of conductive film (i.e.a W film and a barrier metal film) as in the through-hole 33A formed inthe element-forming region and also in the hole 33B formed below thebonding pad BP.

[0056] A plurality of the holes 33B formed below the bonding pad BP arearranged substantially at equal intervals entirely over the lower regionof the bonding pad BP, with the spaces of adjacent holes 33B being, forexample, at 0.6 μm. The diameter of the hole 33B is, for example, at 0.3μm and is almost equal to the diameter of the through-hole 33A or 33Cformed in the interlayer insulating film 29 in other regions. Where awire is bonded to an upper portion of the bonding pad BP, the holes 33Bmay be formed only below the region where the wire is to be bonded (i.e.a region except the peripheral portion of the bonding pad BP), not overthe entirety of the lower region of the bonding pad BP.

[0057] There is formed, on the third-layer wires 30, 31 or on thesurface of the substrate 1, a passivation (surface protective film) film36 constituted, for example, of a two-layered insulating film wherein asilicon oxide film and a silicon nitride film are formed.

[0058] Next, the process for manufacturing the DRAM having such anarrangement as set out hereinabove is described with reference to FIGS.5 to 12.

[0059] Initially, as shown in FIG. 5, MISFET Qt for memory cellselection is formed in the substrate 1 at the memory portion thereof andn-channel MISFET Qn is also formed in the substrate 1 at the peripheralcircuit portion. Thereafter, a bit line BL is formed over the MISFET Qtfor memory cell selection, and first-layer wires 13, 14 are formed overthe n-channel MISFET Qn. Subsequently, an information storage capacitorelement C is formed over the bit line BL to complete a memory cell. Itwill be noted that the method of forming a memory cell having such anarrangement as mentioned above is described in detail, for example, inJapanese Patent Application No. Hei 10(1998)-374881, U.S. patentapplication Ser. No. 09/473.297, filed Dec. 28, 1999.

[0060] Thereafter, as shown in FIG. 6, a silicon oxide film 25 is formedover the information storage capacitor element C, followed by etchingthe silicon oxide film 25 at the peripheral circuit portion and lowerinsulating films (including a silicon oxide film 19, silicon nitridefilm 18 and silicon oxide film 17) to form a through-hole 24 and forminga plug 28 in the through-hole 24. The plug 28 in the through-hole 24 isformed by successively depositing a barrier metal film (TiN film/Tifilm) 28 a and a W film 28 b on the silicon oxide film 25 including theinner surfaces of the through-hole 24 and removing the W film 28B fromthe upper portion of the silicon oxide film 25 by etching.

[0061] As shown in FIG. 7, a second-layer wire 26 is formed on thesilicon oxide film 25 at the memory portion, and a second-layer wire 27is formed on the silicon oxide film 25 at the peripheral circuitportion. The wires 26, 27 are, respectively, formed by successivelydepositing Ti films (26 a, 27 a), AL alloy films (26 b, 27 b) and TiNfilms (26 c, 27 c) on the silicon oxide film 25, followed by etchingthese films and the barrier metal (TiN/Ti) film 28 a left on the siliconoxide film25 in the course of forming the plug 28.

[0062] Next, as shown in FIG. 8, after formation of an interlayerinsulating film 29 by building up a silicon oxide film, a spin-on-glass(spin coating) film and a silicon oxide film over the second-layer wires26, 27, the interlayer insulating film 29 over the wire 27 at theperipheral circuit portion is etched to form a through-hole 33A reachingthe surface of the wire 27, and the interlayer insulating film 29 at thebonding pad region is etched to from holes 33B. The diameter of thethrough-hole 33A is made substantially equal to that of the hole 33B,under which etching conditions can be made uniform. Overetching isperformed in order to completely remove the interlayer insulating film29 from the bottom (at the upper portion of the wire 27) of thethrough-hole 33A, so that the interlayer insulating film 29 at thebottom of the hole 33B, below which no wire is formed, is excessivelyetched, resulting in the depth of the hole 33B larger then that of thethrough-hole 33A.

[0063] Next, as shown in FIG. 9, a barrier metal film 34 a consisting ofa Ti film and a TiN film is deposited on the silicon oxide film 29including the inner surfaces of the through-hole 33A and the holes 33B.Subsequently, W film 34 b is deposited on or over the barrier metal film34 a, followed by removing the W film 34 b from the upper portion of thesilicon oxide film 29 by etching, thereby forming a plug 34 in thethrough-hole 33A and the holes 33B, respectively.

[0064] The Ti film of the barrier metal 34 a constituting part of theplug 34 serves as a bonding layer between the silicon oxide filmconstituting part of the interlayer insulating film 29 and the W film 34b. The overetching permits the TiN film 27 c constituting part of thewire 27 to be removed, thereby causing the Al alloy film 27 b to beexposed at the bottom of the through-hole 33A. Accordingly, the Al alloyfilm 27 b is nitrided upon formation of the TiN film of the plug 34,thereby increasing the contact resistance between the plug 34 and thewire 27. The Ti film constituting part of the barrier metal 34 a isformed below the TiN film in order to prevent the increase of thecontact resistance.

[0065] In this way, the removal of the W film 34 b over the interlayerinsulating film 29 by etching allows the barrier metal film 34 a made ofthe TiN film formed on the Ti film to be left on the interlayerinsulating film 29. The surface of the barrier metal film 34 a isexposed to a fluorine-containing gas (SF₆+Ar) used for the etching, sothat Ti in the barrier metal film 34 a is reacted with excess F(fluorine) and eventually gasified. This may cause the adhesion betweenthe barrier metal film 34 a and the lower interlayer insulating film 29to be lowered. However, since F (fluorine) does not enter inside of thethrough-hole 33A and inside of holes 33B, there is no possibility thatthe adhesion between the barrier metal film 34 a and the interlayerinsulating film 29 in the through-hole 34A and also in the holes 33B islowered.

[0066] Next, as shown in FIG. 12, Ti films (30 a, 31 a, 42 a), Al alloyfilms (30 b, 31 b, 42 b) and TiN films (30 c, 31 c, 42 c) are,successively deposited over the silicon oxide film 29, respectively,after which the barrier metal 34 a left on the silicon oxide film 29during the step of forming the plug 34 is etched to form third-layerwires 30, 31 in the element-forming region and to form a metal pattern(BP) serving as a bonding pad in the bonding pad-forming region.

[0067] Thereafter, after formation of a passivation (surface protectingfilm) film 36 made of a multi-layered film of a silicon oxide film and asilicon nitride film on the surface of the substrate 1, the passivationfilm 36 is removed by etching from the bonding pad-forming region. Atthis stage, the TiN film 42 c is also removed from the metal pattern(BP), thereby exposing the Al alloy film 42 b. According to the stepsset out hereinbefore, the bonding pad BP shown in FIG. 2 is completed.

[0068] Thus, according to this embodiment, a plurality of holes 33B isprovided in the interlayer insulating film beneath the bonding pad BP,in which the plug 34 is buried thereby permitting the surface of eachplug 34 and the lower surface of the bonding pad BP to be contact witheach other. Thus, the adhesion at the interface between the bonding padBP and the interlayer insulating film 29 can be made greater than in thecase where a bonding pad BP is formed on the surface of a flatinterlayer insulating film 29.

[0069] In this arrangement, where an Au wire 70 is bonded on the uppersurface of the bonding pad BP by a ball bonding method using supersonicvibrations in combination as shown in FIG. 13, the adhesion at theinterface between the bonding pad BP and the interlayer insulating film29 is suppressed from lowering, thereby effectively preventingseparation of the bonding pad BP at the interface. In the KGD process,Au wires 70, 71 are, respectively, bonded to the bonding pad BP, asshown in FIG. 14, upon inspection at the stage of individual chips andalso upon inspection at a package stage. In this case, the separation ofthe bonding pad BP at the interface with the interlayer insulating film29 can be effectively prevented.

[0070] In this embodiment, no wire is formed in a wiring layer (secondwiring layer) beneath the bonding pad BP. Accordingly, the regionbeneath the bonding pad BP constituted mainly of Al does not take such astructure that the interlayer insulating film 29 that is harder than Alis sandwiched between upper and lower Al wires, with the result thatthere can be prevented the deficiency that the interlayer insulatingfilm 29 provided beneath the bonding pad would otherwise suffer cracksowing to the impact of wire bonding.

[0071] In this embodiment, there has been described the case where anywire is not form in any wiring layers in the lower region of the bondingpad BP. In this connection, however, it may be possible to form a wire41, shown, for example, in FIG. 15, in a wiring layer (first wiringlayer) lower than the wiring layer (second wiring layer) beneath theholes 33B buried with the plug

[0072] Moreover, limitation is not placed on the case where Au wires(50, 51) are bonded to the bonding pad BP, but the embodiment may beapplicable to the case where a solder bump (or an Au bump) is connectedto the bonding pad BP, as shown, for example, in FIG. 16.

[0073] The invention has been particularly described on the basis of theembodiments, which should not be construed as limiting the inventionthereto, and many alterations and modifications may be possible withoutdeparting the spirit of the invention.

[0074] For instance, in the embodiments set out hereinabove, theapplication to DRAM having a three-layered wire is illustrated, but theinvention may be applied to logic LSI and the like having amulti-layered wire having four or more layers, for example, shown inFIG. 17. It will be noted that where an upper wire 31 (including thebonding pad BP) is constituted of a conductive film made mainly of an Alalloy and the lower wires (51 to 54) are each made of Cu (copper) formedsuch as by the Damascene method, there is little possibility that when aCu wire is formed as a wiring layer beneath the bonding pad, theinterlayer insulating film is cracked because Cu is harder than Al.

[0075] Where the lower wires (51 to 54) are constituted of copper,respectively, these wires (51 to 54) should, respectively, be in theform of conductive films including upper Cu films (51 b to 54 b) formedon barrier metal films (51 a to 54 a) made of TaN and TiN. The materialfor the lower wires (51 to 54) is not limited to copper, but these wiresmay be constituted of a conductive film made of an Al alloy, like theupper wire 31.

[0076] Moreover, as shown in FIG. 18, a lower wire 55, which is notconnected with the plug 34, may be formed in the bonding pad-formingregion. This formation leads to an improvement in bonding between thebonding pad BP and the interlayer insulating film 29 and also torealization of a higher degree of integration by improving the degree offreedom in design of wires.

[0077] Further, as shown in FIG. 19, the upper wire 31 (including thebonding pad BP) may be constituted of a conductive film primarily madeof an Al alloy film (31 b, 42 b) formed by the dual Damascene method.The upper wire 31 (bonding pad BP) is formed by successively depositinga barrier metal film 34 a and an Al alloy film 31 b (42 b) in athrough-hole 33A (hole 33 b) formed in the interlayer insulating film 29and also in an upper wire groove 56, followed by polishing the Al alloyfilm 31 b (42 b) by a chemical mechanical polishing method or etchingback. In this case, the wire 31 (bonding pad BP) and the plug 34 areintegrally combined.

[0078] The effects obtained by typical embodiments of the invention aresummarized below.

[0079] According to the invention, since the plug is formed in theinterlayer insulating film beneath the bonding pad, the adhesion betweenthe bonding pad and the interlayer insulating film can be improved,thereby effectively preventing the separation of the bonding pad.

[0080] Further, any wire is not formed in a wiring layer beneath thebonding pad, so that there can be effectively prevented the disadvantagethat the interlayer insulating film beneath the bonding pad wouldotherwise be cracked owing to the impact at the time of wire bonding.

What is claimed is:
 1. A semiconductor integrated circuit device of thetype which comprises a plurality of wiring layers formed on asemiconductor substrate through an interlayer insulating film, and abonding pad formed at an upper wiring layer, further comprising a firstinterlayer insulating film provided beneath said bonding pad formed, anda first plug formed in said first interlayer insulating film in such away that a first conductive film is buried in a hole formed in saidfirst interlayer insulating film wherein any wire connected to saidfirst plug is not formed in a wiring layer beneath said first plug.
 2. Asemiconductor integrated circuit device according to claim 1 , wherein awire is formed in a wiring layer lower than the wiring layer beneathsaid first plug.
 3. A semiconductor integrated circuit device accordingto claim 1 , wherein any wire is not formed in either of the wiringlayers in a lower region of said bonding pad.
 4. A semiconductorintegrated circuit device according to claim 1 , wherein said firstinterlayer insulating film of an element-forming region has a firstthrough-hole, in which a second plug is buried for electric connectionbetween a wire formed in the upper wiring layer and a wire formed in alower wiring layer, and said first through-hole has a diametersubstantially equal to that of said hole.
 5. A semiconductor integratedcircuit device according to claim 1 , wherein said first interlayerinsulating film of an element-forming region has a first through-hole,in which a second plug is buried for electric connection between a wireformed in the upper wiring layer and a wire formed in a lower wiringlayer, and said hole has a depth greater than said first through-hole.6. A semiconductor integrated circuit device according to claim 1 ,wherein said first conductive film buried in said hole contains arefractory metal film as its main component, and a barrier metal film isformed at the interface between said refractory metal film and the innerwalls of said hole.
 7. A semiconductor integrated circuit deviceaccording to claim 1 , wherein said bonding pad and said first plug areintegrally formed.
 8. A semiconductor integrated circuit deviceaccording to claim 1 , wherein said bonding pad has a length of 80 μm orbelow at one side thereof.
 9. A semiconductor integrated circuit deviceof the type which comprises a plurality of wiring layers formed on asemiconductor substrate through an interlayer insulating film, a bondingpad formed at an upper wiring layer and connected to a wire, furthercomprising a first interlayer insulating film provided at a lower regionof the wire, and a first plug formed in said first interlayer insulatingfilm in such a way that a first conductive film is buried in a holeformed in said first interlayer insulating film wherein any wire is notformed in a wiring layer below the first plug.
 10. A semiconductorintegrated circuit device of the type which comprises a plurality ofwiring layers formed on a semiconductor substrate through an interlayerinsulating film, and a bonding pad formed at an uppermost wiring layer,further comprising a first interlayer insulating film provided beneaththe bonding pad, a first plug formed in said first interlayer insulatingfilm in such a way that a first conductive film is buried in a holeformed in said first interlayer insulating film, and a wire formed in awiring layer beneath said first plug and made of a third conductive filmwhose hardness is higher than that of a second conductive filmconstituting an uppermost wire.
 11. A semiconductor integrated circuitdevice according to claim 10 , wherein said third conductive filmcontains copper as its main component.
 12. A semiconductor integratedcircuit device according to claim 1 , wherein a wire of the wiring layerbeneath said first plug is formed as not to be connected to said firstplug in the lower region of said bonding pad.
 13. A method formanufacturing a semiconductor integrated circuit device comprising thesteps of: (a) forming a wire in an element-forming region on asemiconductor substrate and further forming an interlayer insulatingfilm over said wire; (b) etching the first interlayer insulating film inthe element-forming region to forma first through-hole reaching saidwire, and etching the first interlayer insulating film in a bondingpad-forming region to form a hole; (c) forming a barrier metal film onthe first interlayer insulating film including the inner surfaces ofsaid hole and the inner surfaces of said first through-hole and forminga first conductive film containing as its main component a refractorymetal film on the upper portion of the barrier metal film so that saidfirst conductive film is buried in the hole and the first through-hole;(d) removing said first conductive film from the upper portion of thefirst interlayer insulating film by etching to form a first plugconstituted of said barrier metal film and said first conductive film inthe hole and also a second plug constituted of said barrier metal filmand said first conductive film in said first through-hole; and (e)etching a second conductive film formed on the upper portion of saidfirst interlayer insulating film so that an uppermost wire is formed onsaid first interlayer insulating film in the element-forming region andforming a bonding pad on said first interlayer insulating film in thebonding pad-forming region.
 14. A method for manufacturing asemiconductor integrated circuit device according to claim 13 , furthercomprising, after the step (e), the steps of bonding a first wire onsaid bonding pad and bonding a second wire on said first wire.
 15. Amethod for manufacturing a semiconductor integrated circuit deviceaccording to claim 13 , wherein said barrier metal film is made of amulti-layered film of a TiN film formed on a Ti film, said firstconductive film includes a W film, and the etching of said firstconductive film is carried out in an atmosphere of a gas containingfluorine.